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光刻工艺培训--喷胶状态调整 PPT课件

•Resist is dispensed through the filter •Dispense rate = filtration rate •poor dispense rate control •high stress on the Resist •Dispense start and shut off problems •problems with high viscosity Resist •air vent after filter difficult •low recovery time •less expensive
Resist Dispense
•A low resist temperature will cause an additional suckback due to contraction of resist (adjust low initial suckback) •A high Resist temperature will cause a dripping of Resist due to expansion of Resist
track should be as close as possible (temperature
settling time between two recipes) •inside water jacked are just 7 cc of resist (no
11940.0
multiple dummy dispense before process start)
•IWAKI SB pump •MILLIPORE WCDS / WCDP pump •IDI Pump
Stepper Motor driven Pumps
•can control low dispense volume •good to excellent dispense volume repeatability •can control low dispense rates •high investment cost
•Resist Temperature •Resist Dispense system
•Pump type (pneumatic / motor driven, single / double stage) •Resist Filter (material, type, pore size) •Dispense line (length, diameter, material, nozzle diameter) •Resist Dispense •Resist Dispense Volume •Resist Dispense Rate •Dispense Pump adjustment
April 20
Resist temperature measurement at nozzle block shows large error
4
Resist Temperature
Resist Temperature influence on uniformity
•major parameter to adjust coating uniformity •recommended setting range: 21.0 - 24.0°C •best temperatures of different Resists at same
Dispense adjustment
panc
1
Resist Dispense Parameter
• Coating process parameter • Pump • Air-operator valve • Resist
2
Coating Process Paramபைடு நூலகம்ter
Resist Dispense
•IWAKI FT 100-1 pump •CYBOR 5120 pump •MILLIPORE GEN2 •MILLIPORE IntelliGEN •TEL RDS pump
April 20
6
Resist Dispense System - Pump type
Single Stage Pumps
Motor Flange Temperature
April 20
3
Resist Temperature
Old style water jacked
New style water jacked
Resist temperature measurement at nozzle block possible
Resist Film Uniformity vs. Resist Temperature
11980.0 11960.0
22.0°C 3-s: 32.2 A 22.1°C 3-s: 11.1A 22.2°C 3-s: 9.2A 22.3°C 3-s: 15.1A 22.4°C 3-s: 25.4A
Resist Film Thickness [A]
11920.0
-80
-60
-40
-20
0
20
40
60
80
Resist temperature Calibration
Wafer Diameter
•calibration needs to be done regularly (every 3 - 6 month)
•watch for right measurement position (old and new style)
(adjust a high initial suckback)
April 20
5
Resist Dispense System - Pump type
Pneumatic driven Pumps
•already since long time in use •not for low dispense volumes •limited dispense volume repeatability •no good dispense rate control •low investment costs
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