XE-100 High Accuracy Small Sample SPMPSIAXE-100Anodized Aluminum Surface (0.5×0.5 µm )(Sample Courtesy of Prof. J.K. Lee, Seoul National University.)Steel Surface (10×10µm)STI Patterns on Photomask (5×5 µm )Self Assembled Monolayers (10×10 µm )MFM Image of Hard Disk (30×30 µm )>>>>>Semiconductors Data Storage & Magnetic MaterialsBiotechnology & Life SciencesPlastics & PolymersMaterials & Surface CharacterizationsWide Range of Applications NC-AFM Image of porous Polymer (6×6µm )XE system produces higher quality images faster . Z scannerof the XE system has a resonance frequency significantlyhigher than those of conventional piezoelectric tubescanners. The result is greater feedback performance andfaster and more accurate data acquisition. Also, since zscanner is physically separated from x-y scanner, there is nocoupling between the x-y plane and the z scanner.from the Nano Techn SPM with Improved Scan Accuracy, Scan Speed, and Optical VisionSuperior optical microscope provides directon-axis view with unprecedented clarity.All optical elements – objective lens, tube lens,and CCD camera – are rigidly fixed on a singlebody and move together for focusing andpanning to keep the highest quality intact.Z scanner moves only the cantilever and thedetector (PSPD), while the laser, steering mirrorand aligning mechanisms are fixed on the headframe. Laser beam bouncing off the second mirrorhits the same point on PSPD regardless of the zscanner motion, and only the deflection of thecantilever is monitored on the PSPD.New XE scan system provides distortion-free scan.By separating z scanner from x-y scanner , we caneliminate the cross talk between the x-y and z axes.We can achieve high scan accuracy and fastz-tracking speed. Since the sample is scanned only inx-y direction, large samples as well as small samplescan be scanned at sufficiently high speeds.High Quality Optical Microscope*Advanced Scan System*x-y scannerzscan ne ruser convenience, and serviceability.nology Leader*Patent pendingForming AFM image by dilation J.S. Villarrubia, J. Res. Natl. Inst. Stand. T echnol. 102, 425 (1997)Geometrical interpretation of erosion:Reconstructed image is equivalent to theminimum of tip's envelopeHermetically SealedAcoustic EnclosurePowerful ElectronicsXE system includes an acoustic enclosure thatshields the XE head from external acoustic andoptical noise. The enclosure is hermeticallysealed, ensuring high efficiency.High Performance Computer and the Latest Operating System Pentium IV 1.7 GHz, 256 MB RAM, 40 GB HDD, CD ROM,17 inch LCD monitor,Windows XP operating system®XEP - Data Acquisition Program XEI - Image Processing Programfor Excellence!Advanced XE Software!XE is controlled by the state-of-the-art DSP TMS320C6701running at 167 MHz, providing 1,000 MFLOPS!XE has fast 14 DACs and 5 ADCs14 channel DAC (416-bit, 1012 bit) at 500 kHz settling rate28 channel ADC (516-bit plus MUX) at 500 kHz sampling rate!Fast and versatile USB interface×××Mechanical Sample size: up to 100×100 mm, 20 mm thick Sample mass: up to 500 g Sample stage travel: 25×25 mm with manual micrometer X-Y scanner Single module parallel-kinematics flexure stage Scan size: 50×50 µm (5×5 µm in low voltage mode) 100×100 µm (10×10 µm in low voltage mode)Resolution: < 0.15 nm (< 0.02 nm in low voltage mode)Z-scanner Guided flexure stage Scan size: 12 µm (1.7 µm in low voltage mode)Resolution: 0.05 nm (0.01 nm in low voltage mode)Z-stage Travel: 30 mm Resolution: 0.08 µm Max speed: 30,000 step/sec Optical microscope Magnification: 600× on 10.4 inch LCD monitor Resolution: 1 µm (0.28N.A.)Focus range: 12 mm Electrical DSP: TMS320C6701 at 167 MHz (1,000 MFLOPS)14 channel DAC (4×16-bit, 10×12 bit) at 500 kHz settling 28 channel ADC (5×16-bit with MUX) at 500 kHz sampling Computer ®Windows operating system Pentium IV 1.7 GHz, 256 MB RAM, 40 GB HDD, CD ROM,3.5 inch 1.44 MB FDD, 17 inch LCD monitor XP Standard Techniques Atomic Force Microscopy (AFM)Dynamic Force Microscopy (DFM)Non-Contact AFM (NC-AFM)Lateral Force Microscopy (LFM)Scanning Tunneling Microscopy (STM)Advanced Techniques Electrostatic Force Microscopy (EFM)Dynamic-Contact EFM (DC-EFM)‡Scanning Capacitance Microscopy (SCM)Magnetic Force Microscopy (MFM)Force Modulation Microscopy (F M M)Scanning Thermal Microscopy (SThM)Scanning Probe Lithography (SPL)Specifications are subject to change without notice.Windows XP is a registered trademark of Microsoft corporation.‡DC-EFM : US Patent 6,185,991。