System default location
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File .cdsinit Purpose A Cadence SKILL language file executed when the Cadence design framework II (DFII) product starts. User location ~/.cdsinit Sample location your_install_dir/tools/dfII/samples/local/cdsinit System default location ./.cdsinit File cds.lib Purpose Sets the paths to libraries and other cds.lib files. INCLUDE your_install_dir/share/cdssetup/cds.lib
Ctrl+A 全选 + Shift+B Return,升到上一级视图 Ctrl+C 中断某个命令,一般用 + ESC代替. Shift+C 裁切(chop). + C 复制.复制某个图形 Ctrl+D 取消选择.亦可点击空白 + 处实现. Ctrl+F显示上层等级 + Shift+F显示所有等级 + F fit,显示你画的所有图形 K 标尺工具 Shift+K清除所有标尺. + L 标签工具 M 移动工具 Shift+M 合并工具,Merge + N 斜45对角+正交. Shift+O 旋转工具.Rotate + O 插入接触孔. Ctrl+P 插入引脚. Pin + Shift+P 多边形工具.Polygon + P 插入Path.路径. Q 图形对象属性.选中一个图形先 R 矩形工具.绘制矩形图形. S 拉伸工具.可以拉伸一个边.也 可以选择要拉伸的组一起拉伸. U 撤销. Undo. Shift+U重复.Redo.撤销后反悔 +
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忽略版图中无法体现的一些mask:诸如channel stop,阈值电压调整等 要介绍的第三张mask为poly mask: 它包含了多晶硅栅以及需要腐蚀成的形状.这还用 来定义源漏的自对准.
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第四张mask定义为n+mask,用来定义需要注入 n+的区域.可以看到多晶硅栅用来作为源漏的自 对准层.这里的注入为两次注入,首先轻掺杂注 入,在栅上生成一层氧化层后再重掺杂注入,形 成LDD结构.
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Using the Display Options Form
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Using the Layout Editor Options Form
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Layer Selection Window(LSW)
The LSW lets you choose the design layer for each shape you create, make design layers visible or invisible, or make instances and pins selectable or unelectable.
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File .cdsplotinit Purpose Initialization script for plot operations. User location ~/.cdsplotinit Sample location your_install_dir/tools/plot/samples/cdsp lotinit.sample System default location ./.cdsplotinit
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File display.drf Purpose Specifies how you want your layers to appear on your monitor and in your plots. User location ~/display.drf Sample location your_install_dir/share/cdssetup/dfII/def ault.drf System default location ./display.drf
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Setting Up Your Environment
Setting Layout Editor Defaults: Before you can start working in the Virtuoso layout editor, several startup files must be initiated. Some of the things these files do include setting up your environment, pointing to libraries, and defining your plotters.
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第五张mask是p+mask. p+在Nwell中用来定义PMOS管或者走线;p+在 Pwell中用来作为欧姆接触.LDD不必用来形成 PMOS,这是因为热载流子在PMOS中受影响小.
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第六张mask就是定义接触孔了. 首先腐蚀SiO2到需要接触的层的表面.其次要能够 使金属接触到扩散区或者多晶硅区.
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Making All but One Layer Unselectable
In the LSW, press Shift and click middle on the layer you want to be the only selectable layer.
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Startup Files
File .cdsenv Purpose Holds application defaults for environment variables. User location ~/.cdsenv Sample location
your_install_dir/tools/dfII/samples/.cdsenv
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第七张mask就是金属1(metal1)了. 需要选择性刻蚀出电路所需要的连接关系. 至此,一个反相器的完整版图就完成了.
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2 Design Rule的简介
图解术语
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第一张mask定义为n-well(or n-tub)mask a)离子注入:制造nwell. b)扩散:在所有方向上扩散,扩散越深,横向也延 伸越多.
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第二张mask定义为active mask. 有源区用来定义管子的栅以及允许注入的p型或 者n型扩散的管子的源漏区.
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Setting Valid Layers
Choose Edit – Set Valid Layers in the LSW
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Making One Layer Selectable or Unselectable In the LSW, click middle on the layer. The layer color disappears. The layer name is shaded, to show that the layer is also unselectable.
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一个简单的例子
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3 Virtuoso软件的简介及使用
You use the Virtuoso layout tools to prepare custom integrated circuit designs. Create and edit polygons, paths, rectangles, circles, ellipses, donuts, pins, and contacts in layout cellviews Place cells into other cells to create hierarchical designs Connect a pin or group of pins in a net internally or externally Create special pcells or use SKILL language commands
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Controlling the Icon Menu
You can control CIW->Option->User… Where the icon menu appears Whether the menu appears at all Whether icon names appear
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Using Search
The Search command lets you search for objects with specific attributes or property values.